Impact of interstitial oxygen trapped in silicon during plasma growth of silicon oxy-nitride films for silicon solar cell passivation

Thu, 2021-07-22 16:08 — venkatr
TitleImpact of interstitial oxygen trapped in silicon during plasma growth of silicon oxy-nitride films for silicon solar cell passivation
Publication TypeJournal Article
Year of Publication2016
AuthorsSaseendran, S. S., S. Saravanan, M. C. Raval, and A. Kottantharayil
JournalJournal of Applied Physics
Volume119
URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-84960155488&doi=10.1063%2f1.4943177&partnerID=40&md5=0d06b968eae5b9a2a8ef9a8808e506a7
DOI10.1063/1.4943177

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