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Impact of interstitial oxygen trapped in silicon during plasma growth of silicon oxy-nitride films for silicon solar cell passivation
Thu, 2021-07-22 16:08 — venkatr
| Title | Impact of interstitial oxygen trapped in silicon during plasma growth of silicon oxy-nitride films for silicon solar cell passivation |
| Publication Type | Journal Article |
| Year of Publication | 2016 |
| Authors | Saseendran, S. S., S. Saravanan, M. C. Raval, and A. Kottantharayil |
| Journal | Journal of Applied Physics |
| Volume | 119 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84960155488&doi=10.1063%2f1.4943177&partnerID=40&md5=0d06b968eae5b9a2a8ef9a8808e506a7 |
| DOI | 10.1063/1.4943177 |