Study of defect formation from process step anomalies in limited boron source diffusion in crystalline silicon

Thu, 2021-07-22 16:09 — venkatr
TitleStudy of defect formation from process step anomalies in limited boron source diffusion in crystalline silicon
Publication TypeConference Paper
Year of Publication2016
AuthorsSingha, B., and C. S. Solanki
Conference NameAIP Conference Proceedings
URLhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-84984562957&doi=10.1063%2f1.4946635&partnerID=40&md5=b52dc6cd48d71abdd65ef552a7ab1869
DOI10.1063/1.4946635

Department of Energy Science and Engineering Indian Institute of Technology Bombay Powai, Mumbai - 400076, INDIA

© 2022 All rights reserved, IIT Bombay