- Research
- Research
- Publications
- PhD Theses
- Projects
- Academics
- Admissions
- M.Tech @ ESE
- Ph.D @ ESE
- DD MSc - Phd
- DD (B.Tech.-M.Tech.)
- B.Tech
- Minor in Energy
- Faculty Advisors
- Activities
- News and Events
- Seminars
- List of Holidays
Growth of silicon nitride by nitridation of amorphous silicon at low temperature in hot-wire CVD
Thu, 2021-07-22 16:10 — venkatr
| Title | Growth of silicon nitride by nitridation of amorphous silicon at low temperature in hot-wire CVD |
| Publication Type | Journal Article |
| Year of Publication | 2017 |
| Authors | Rai, D. K., C. S. Solanki, and B. R. Kavaipatti |
| Journal | Materials Science in Semiconductor Processing |
| Volume | 67 |
| Pagination | 46-54 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85019251703&doi=10.1016%2fj.mssp.2017.05.015&partnerID=40&md5=b71269217724885f7666cbd54abb996b |
| DOI | 10.1016/j.mssp.2017.05.015 |