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Ultra-thin SiNx in superlattice via nitridation of a-Si in-situ hot wire chemical vapor deposition
Thu, 2021-07-22 16:08 — venkatr
| Title | Ultra-thin SiNx in superlattice via nitridation of a-Si in-situ hot wire chemical vapor deposition |
| Publication Type | Journal Article |
| Year of Publication | 2014 |
| Authors | Rai, D. K., C. S. Solanki, and K. R. Balasubramaniam |
| Journal | Thin Solid Films |
| Volume | 565 |
| Pagination | 101-104 |
| URL | https://www.scopus.com/inward/record.uri?eid=2-s2.0-84905755989&doi=10.1016%2fj.tsf.2014.07.003&partnerID=40&md5=c862dc694a5809a7e76cbf60f46d6270 |
| DOI | 10.1016/j.tsf.2014.07.003 |